In the semiconductor manufacturing process, several key stages need to be conducted in a cleanroom environment to ensure the quality and integrity of the devices. These stages include:

: This includes processes such as photolithography, etching, ion implantation, and chemical vapor deposition. These processes require extremely clean environments to prevent any contamination that could lead to defects in the microscopic features of the chips.

: The growth of silicon dioxide layers and the deposition of various materials on the wafer surface need to be done in a cleanroom to avoid any impurities that could affect the electrical properties of the materials.

: This process involves smoothing the wafer surface using a combination of chemical and mechanical forces. A clean environment is essential to prevent scratches or contamination on the wafer surface.

: The introduction of impurities into the semiconductor to change its electrical properties is a highly sensitive process that must be performed in a controlled environment to achieve precise doping levels.

: The process of applying metal layers to the wafer to create electrical connections also requires a cleanroom to prevent any particles from interfering with the thin metal films.

: Even after the chips are fabricated, the assembly and packaging processes need clean environments to avoid contamination that could affect the performance and reliability of the final semiconductor products.

Cleanrooms are critical in semiconductor manufacturing to maintain the purity and precision required for high-performance and reliable semiconductor devices.